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Beilstein J. Nanotechnol. 2012, 3, 213–220, doi:10.3762/bjnano.3.24
Figure 1: Trichlorosilyl thioesters.
Figure 2: Thickness and contact angles (advancing/receding) for SAMs based on compounds 1b–i.
Figure 3: UV–vis spectra of SAMs of compounds 1a, 2, 3 and 4.
Figure 4: Representative sulfur XPS analyses of the SAMs of compounds 2 (A), 3 (B) and 4 (C).
Figure 5: ATR–FTIR spectra of SAMs of compounds 1a, 2, 3 and 4, as deposited, and after oxidation with UV-A i...